業務項目

聯係我們

. 公司地址:浙江. 寧波市朝暉路416
   262號綜合樓11

. 谘詢熱線:400-688-7052
. 谘詢電話:0574-87770896

. 24小時電話:13615884573
值班電話:0574-87377879
. 公司傳真:0574-87779860
E-Mail:jeston@tanglang1688.com
. 公司在線谘詢
QQ:800017275

當前所在位置: 首頁 > 我們的服務

韓國食品級測試KFDA(한국 식품 등급의 재료 시험)
AGVIP認證檢測公司專業提供各類出往韓國市場的食品接觸類材料的KFDA檢測、KFDA測試一站式專業辦理,

常見的KFDA測試材料和測試項目如下:

KFDA 韓國

Material

Test Item

合成樹脂
  Synthetic Resin
 (general standard)

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

(except for PF, UF, MF, POM)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

PVC
聚氯乙烯

Dibutyltin

Vinylchloride Monomer(VCM)

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

phthalates(DBP,BBP,DEHP,DnOP,DINP,DIDP,DEHA) (in water, 4% acetic acid, 20% ethanol and n-heptane)

Cresylphosphoric ester

PP,EVA, PPS,
PMP(polymethylpentene), PVA(Polyvinyl Alcohol), PB-1 ( Polybutene-1), Polyimide(PI),
 Hydroxybutyl(HBP), Fluoro Resins(FR), Ionomer resin, Polyethylene naphthalate(PEN), Ethylene Vinyl Polyetheretherketone(PEEK),

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

PS 聚苯乙烯
  Polyphenylene ether
 (PPE),
聚亞苯基氧化 物樹脂

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

Volatile matter

PVDC
聚偏二氯乙烯包裝材料

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

Barium

Vinylidene chloride

PET
滌綸樹脂

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

Soluble Antimony in 4% acetic acid(Elution)

Soluble Germanium in 4% acetic acid(Elution)

Terephthalic acid (elution)

Isophthalic acid(Elution)

PF(Phenol 
formaldehyde)
苯酚甲醛醛樹脂

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

Phenol(Elution-4% acetic acid)

Formaldehyde(Elution-4% acetic acid)

MF(melamine
formaldehyde)
 
三聚氰胺甲醛樹脂

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

Phenol(Elution-4% acetic acid)

Formaldehyde(Elution-4% acetic acid)

melamine(Elution-4% acetic acid)

UF
 (ureaformaldehyde)
尿醛樹脂

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

Phenol(Elution-4% acetic acid)

Formaldehyde(Elution-4% acetic acid)

Acrylic resin
丙烯酸樹脂
亞克力樹脂

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

Methylmethacrylate(Elution-20% ethanol) (contains over 50% methylmethacrylate)

 PA
尼龍

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

4,4'-methylenedianiline(Elution-4% acetic acid)

Ethylenediamine(Elution)

Hexamethylenediamine(Elution)

Caprolactam(Elution-20% ethanol)

PC
聚碳酸酯

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

BPA(include phenol, BPA,pt-butylphenol)

Bisphenol A(Elution-include phenol, BPA,pt-butylphenol))

Diphenylcarbonate

Amines(Triethylamine and tributylamine)

  PU 
    
聚胺酯樹脂

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

4,4'-methylenedianiline( acetic acid)

isocyanate(in water, 4% acetic acid, 20% ethanol and n-heptane)

ABS, AS
    
丙烯腈共聚物
    
苯乙烯共聚物

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

Volatile matter

1,3-butadiene

Acrylonitrile(Elution-water)(

 (MS)Polymethacrylstyrene
聚苯乙烯

Volatile matter

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

Methylmethacrylate(Elution-20% ethanol)

PAN
    
平底鍋,盤子

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

Acrylonitrile(Elution-water)

MABS
 ABS
添加PMMA共合
 
成的透明級的ABS

Volatile matter

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

1,3-butadiene

Acrylonitrile(Elution-water)

Methylmethacrylate(Elution-20% ethanol)

4,4'-methylenedianiline( acetic acid)

 Epoxy resin
環氧樹脂

BPA(Elution-include phenol, BPA,pt-butylphenol))

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

BPA diglycidyl ether(elution)

BPA F diglycidyl ether(elution)

Epichlorohydrin(elution-n-heptane)

Amines

聚酯PCT

Terephthalic acid (elution)

Isophthalic acid(Elution)

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

Antimony in 4% acetic acid

 PE
聚乙烯

1- hexane(elution)

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

1-octene(elution)

Polyarylsulfone
(PASF)
聚芳碸

Bisphenol A(Elution-include phenol, BPA,pt-butylphenol)

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

4,4'-dichlorodiphenyl sulfone(Elution)

PES
聚醚碸樹脂

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

4,4'-dichlorodiphenyl sulfone(Elution)

 POM
 
聚甲醛

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

Formaldehyde(Elution-4% acetic acid)

聚酯PBT

Terephthalic acid (elution)

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

Isophthalic acid(Elution)

 PAR
聚芳酯

Terephthalic acid (elution)

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

Isophthalic acid(Elution)

Bisphenol A(Elution-include phenol, BPA,pt-butylphenol))

聚酯 PLA/PBSA

As(elution

formaldehyde in 4% acetic acid (elution)

flurescent matter

PMP
polymethylpentene
聚甲基戊烯

4-methyl-1-pentene (elution)

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

PPS
(poly(phenylenesufide)
聚苯硫醚

1,4-dichlorobenzene(elution)

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

Crosses-linked  
polyester resin
聚脂樹脂  

Terephthalic acid (elution)

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

Heavy metal as lead(Elution)

Consumption of Potassium Permanganate(Elution)

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

Isophthalic acid(Elution)

玻璃紙 cellophane 
     ( regenerated 
      cellulose film)

As in 4% acetic acid (elution)

total Pb

total Cd

total Hg

total Cr(VI)

Heavy metal as lead (Elution)

Evaporation Residues (4% acetic acid)

Rubber,silicone resin,
BDR(Butadiene resins), TPE
橡膠,彈性體

2-mercaptoimidazoline

Total lead

Total cadmium

Heavy metal as lead in 4% acetic acid

Evaporation Residues (water, 20% ethanol for oil food)

Evaporation Residues (water)----for rubber pacifiers

Phenol in 4% acetic acid(Elution)

Formaldehyde in 4% acetic acid (Elution)

Zinc in 4% acetic acid (elution)

Zinc in water(elution)

Nitrosamine and nitrosatable substances (only for rubber nipple)

紙製品
     Paper /processed 
 paper

PCBs(AC 1221, AC1232, AC 1242, AC1248, AC1254, AC1260)

Total lead

Total Cadmium

Total Mercury

Total Chromium(VI)

As in  4% acetic acid (elution)

Heavy metal as lead in 4% acetic acid (Elution)

Evaporation Residues

Formaldehyde in water (Elution)

flurescent matter

Metal containers,  
packages
and apparatus
 
金屬容器/包裝/設備  

Pb, Cd,Ni in water( food pH >5)or 0.5% citric acid(food pH<5)

Cr(VI) in in water( food pH >5)or 0.5% citric acid(food pH<5)

As in 4% acetic acid

Evaporation Residues (water)

Evaporation Residues (4% acetic acid)

Evaporation Residues (20% ethanol)

Evaporation Residues (n-heptane)

formaldehyde in 4% acetic acid (elution)(with coating)

Vinylchloride Monomer(Elution)

Epichlorohyfrin(Elution)

BPA(Elution-include phenol, BPA,pt-butylphenol)

BPA diglycidyl ether(elution)

BPA F diglycidyl ether(elution)

         Wood 木頭

As in water (elution)

Heavy metal as lead in water (Elution)

sulfur dioxide in water (elution)

ortho-phenylphenol in 20% ethanol(elution)

thiabendazole in 20% ethanol(elution)

biphenyl in 20% ethanol(elution)

imazalil in 20% ethanol (elution)

玻璃,陶瓷glass,ceramic,enamel, pottery

Cadmium(Elution)

Lead(Elution)

As (elution)(only for pottery)

澱粉
 starch

lead

cadmium

Total Mercury

Total Chromium(VI)

As in water(elution)

Heavy metal as lead in 4% acetic acid (Elution)

formaldehyde in 4% acetic acid (elution)

Consumption of Potassium Permanganate(Elution)

flurescent matter

 
共有1條  1/1首頁上一頁下一頁尾頁